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Elemental Mapping of Printed Ink Using the J200 Tandem LA-LIBS Instrument in Combination with the PlasmaQuant MS Elite ICP-MS Application Note · PlasmaQuant MS Elite

Challenge

  • Fast and precise elemental mapping in printed ink within a wide measurement range.

Solution

  • Simultaneous detection of elements including non-metals using LIBS in combination with LA-ICP-MS.

Introduction

The J200 Tandem LA–LIBS instrument from Applied Spectra, Inc. provides the unique capability of combining the analytical benefits of both LA-ICP-MS (Laser Ablation-Inductively Coupled Plasma-Mass Spectrometry) and LIBS (Laser Induced Breakdown Spectroscopy). Specifically, LIBS provides greater elemental coverage from H – Pu, including elements that are difficult or impossible by conventional ICP-MS instrument such as non-metals (e.g. H, N, O), and halogens (e.g. F).

When coupled with an Analytik Jena PlasmaQuant® MS Elite ICPMS, it can perform LA-ICP-MS measurements focusing on trace elemental and isotopic ratio compositions. Due to the LIBS option it expands the dynamic range of analysis from sub-ppb levels with LA-ICP-MS, to % levels with LIBS.

The ability to determine the elemental distribution in a given sample can be very valuable for manufacturing, failure analysis, and/or quality control in an industrial environment. In general, elemental mapping evaluations take hours to get high-quality, detailed images.

Therefore, improvement to analysis time results in significant advancements in the efficiency of these types of analysis. Using the J200 Tandem LA-LIBS in combination with the PlasmaQuant® MS Elite allows for fast and precise elemental mapping. The data obtained from these experiments (ICP-MS and LIBS) are analyzed and mapped effortlessly using Applied Spectra’s Data Analysis Software Package.

Download the complete Application Note

Elemental Mapping of Printed Ink Using the J200 Tandem LA-LIBS Instrument in Combination with the PlasmaQuant MS Elite (EN)

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PlasmaQuant MS Series Robust system for efficient, stable characterization of high matrix samples: PlasmaQuant MS offers excellent plasma robustness for high matrices, minimized drift at changing matrix load and efficient interference management with outstanding ease of use.

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