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Elemental analysis for electroplating Determination of elements in process solutions using F-AAS and ICP-OES

October 6, 2026 10:00 AM & 04:00 PM CEST

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Contents of this web seminar

When: October 06, 2026, 10:00 AM & 04:00 PM CEST
Duration: ~60 min
Language: English
Speakers:
Dr. Holger Sievers, Product Manager AAS, Analytik Jena GmbH+Co. KG
Dr. Kilian Schneider, Product Specialist OCP-OES, Analytik Jena GmbH+Co. KG
 

Electroplating and surface finishing laboratories rely on robust elemental analysis to ensure process stability, product quality, and regulatory compliance. This web seminar provides a practical comparison of Flame AAS, High-Resolution Continuum Source Flame AAS (HR-CS AAS), and ICP-OES for a routine electroplating analysis in the plating industry. Participants will learn the fundamental differences between these techniques, including a comparison of the performance of conventional AAS systems, High-Resolution Continuum Source AAS, and ICP-OES. 

The web seminar highlights the strengths and limitations of each approach and provides guidance on selecting the most suitable technique based on analytical requirements, sample throughput, laboratory workflows, user expertise, and operational effort. Practical application examples will cover process solutions such as plating baths, etching solutions, stripper solutions, and wastewater treatment samples. The comparison between AAS and ICP-OES will also address typical analytical applications and achievable sample throughput in routine laboratory operation. 

In addition, the webinar discusses recommended sample preparation procedures for different sample matrices, common sources of analytical error, and proven quality control (QC) measures to ensure accurate and reliable results. Through real-world examples and best practices, attendees will gain valuable insights into optimizing analytical workflows, selecting the appropriate analytical technique, and improving confidence in their measurement data.

Key learning objectives:

  • Identify the appropriate use cases for Flame AAS (F-AAS), High-Resolution Continuum Source Flame AAS (HR-CS AAS), and ICP-OES in electroplating and surface finishing laboratories
  • Prepare and treat samples correctly, including selecting and applying appropriate sample preparation procedures for different process and wastewater matrices
  • Interpret and evaluate analytical results and ensure measurement accuracy through appropriate quality control (QC) procedures and validation practices

Who should attend?

  • Laboratory managers and supervisors in electroplating and surface finishing
  • Analytical chemists and laboratory technicians
  • Process engineers and quality managers responsible for plating operations, wastewater treatment, and quality control

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